EE412 Report: Team ALD Nitride
نویسندگان
چکیده
Standard nitride recipes for Savannah were tried first. Woollam M2000 spectroscopic ellipsometer (Woollam) and SSI SProbe X-Ray Photoemission Spectrometer (XPS) were used for thickness and composition measurements. However, the results were undesirable. For example, the results of Woollam showed that Hf3N4 films with 500, 375, and 250 cycles well matched to the corresponding HfO2 models. Furthermore, the resultant growth rate was similar to that of HfO2 film from the ALD oxide group. XPS results of the Hf3N4 films deposited with standard recipes showed no nitrogen signature but a huge amount of oxygen even after 12 seconds of Ar sputtering, which was calibrated to sputter 10 nm/min of SiO2. TiN deposited with standard recipes showed similar results. The results of Woollam showed that TiN films with 500, 375, and 125 cycles fitted well to the corresponding TiO2 models. The XPS measurements showed that the ratio of oxygen over titanium is approximately two, confirming stoichiometric TiO2. Also, no nitrogen signature exhibited.
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